Nanoimprint lithography is a fabrication technique used for low cost, high throughput, and high-resolution nanometre scale patterns.
There are 3 main subcategories with NIL:
Thermoplastic nanoimprint lithography (T-NIL): Spin coating thin layer of thermoplastic polymer on to substrate, transfer mold pattern into polymer film, dry etching to transfer pattern to substrate.
Photo nanoimprint lithography (P-NIL): Spin coating with photo curable liquid resist, transparent stamp, UV Cure, separation
Resist-free direct thermal nanoimprint lithography (Hot Embossing): Force and temperature to directly transfer stamp into thermoplastic polymer.